Name: 8/6/4/2 inch LPCVD oxidatieoven Volledige automatisering Lage zuurstofcontrole Dunne film afzetting
Uploaded: 2026-03-10CDT00:13:12-05:00
Duration: 46 s
Description: Discover the 8/6/4/2Inch LPCVD Oxidation Furnace, a fully automated system for thin film deposition with low oxygen control. Ideal for semiconductor manufacturing, it ensures excellent film uniformity and repeatability, supporting various oxidation, annealing, and LPCVD processes. Perfect for high-volume production with seamless MES integration.

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8/6/4/2 inch LPCVD oxidatieoven Volledige automatisering Lage zuurstofcontrole Dunne film afzetting

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April 27, 2025

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Video beschrijving:

Discover the 8/6/4/2Inch LPCVD Oxidation Furnace, a fully automated system for thin film deposition with low oxygen control. Ideal for semiconductor manufacturing, it ensures excellent film uniformity and repeatability, supporting various oxidation, annealing, and LPCVD processes. Perfect for high-volume production with seamless MES integration.

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